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Pub. ID 8198
| Internal author | Old internal author |
Title:
LASER-PROJECTION-PATTERNED ETCHING OF GAAS IN A CHLORINE ATMOSPHERE
Authors:
FOULON F, GREEN M, GOODALL FN and DEUNAMUNO S
Publication:
"LASER-PROJECTION-PATTERNED ETCHING OF GAAS IN A CHLORINE ATMOSPHERE", FOULON F, GREEN M, GOODALL FN and DEUNAMUNO S, JOURNAL OF APPLIED PHYSICS 71 (6) pp.2898-2907 (1992)
Publication Date:
15/03/1992
ISBN:
ISSN:
0021-8979
Abstract:
Laser-projection-patterned etching of gallium arsenide in a chlorine atmosphere performed with a pulsed KrF excimer laser (lambda = 248 nm, tau = 15 ns) and deep uv projection optics (resolution: 2-mu-m) is reported. The etching process carried out in a